Enable advanced plasma processes control via highly accurate power delivery, frequency tuning, and multi-level pulsing.
To manufacture leading-edge integrated circuits (ICs), new processes and materials are deployed for transistor or memory cell creation. Declining feature size and atomic-level precision make extreme process control essential. And new device architectures (3D-NAND and Fin FETs) drive multi-patterning (double and quadruple) demand — making innovative etch and deposition processes vital.
Advanced Energy is a market leader in power delivery and control solutions for critical etching, deposition, inspection, implantation, and annealing processes. Thanks to our platform architecture and commitment to innovation, we can develop strategic partnerships, anticipate your application needs, and rapidly design products and solutions for your specific requirements.