Plasma Processes and Materials
Plasma Processes and Materials Applications
AE offers a comprehensive portfolio for semiconductor deposition, including plasma power delivery, temperature measurement, temperature control, and wafer control solutions.
Advanced Energy's high-precision plasma power delivery systems provide exacting control of etch applications for high repeatability and yield.
Silicon Carbide Crystal Growth
SiC is used in many different technologies that require a high thermal conductivity, low thermal expansion, and a maximum current density.
Empowering Innovation with Plasma Processing and Materials SolutionsAdvanced Energy has harnessed our extensive expertise to pioneer high-performance plasma processing and materials solutions, designed to elevate the standards of semiconductor fabrication. Our specialized products are purpose-built to streamline a variety of complex, high-tech manufacturing processes, including critical steps such as etching, deposition, and silicon carbide processing. Our high-accuracy, high-reliability power supplies and matching networks are engineered for steady and efficient plasma generation and maintenance, leading to consistent etching and deposition rates. This precise control is key to achieving superior manufacturing outcomes, characterized by high quality and uniformity in end products.
Diving deeper into Silicon Carbide (SiC) power device manufacturing, we have leveraged our knowledge and skills to become a leader in this specialized field. SiC devices are increasingly significant in various sectors, including power electronics, automotive, and renewable energy industries, due to their unique electrical and thermal properties. Our sophisticated power systems enable unprecedented control over SiC fabrication processes, thereby minimizing defects and ensuring superior performance.
Our solutions provide efficient cooling, leading to enhanced device longevity and reliability, even under demanding operating conditions. This dual approach—precision power control and efficient thermal management—demonstrates our unwavering commitment to pushing the boundaries of advanced material processing technologies, ultimately supporting the success and growth of our customers in the fast-paced semiconductor industry.
eVoS LE Bias Solution