A previous AE blog, Dynamic Reverse Pulsing – What About Duty Cycle?, discussed reactive sputter deposition of insulating thin films in large-area coaters, describing the benefits of using the Dynamic Reverse Pulse (DRP) power-delivery mode over the bipolar (BP) mode of dual magnetron sputtering. In DRP mode , dual targets are bipolar pulsed against an explicit anode and the duty cycle can be varied so that the polarity is positive on the target for a shorter time during pulsing. This allows clearing of charge build-up on the targets. In our studies, DRP mode showed increased deposition rate and reduced substrate temperature when compared to similar depositions with the BP mode.

DENVER, Colo.--(BUSINESS WIRE)-- Advanced Energy Industries, Inc. (NASDAQ: AEIS), a global leader in highly engineered, precision power conversion, measurement, and control solutions, today announced that its board of directors has authorized a quarterly cash dividend of $0.10 per share, payable on December 1, 2023 to shareholders of record as of November 20, 2023. Future dividend ...

Last month marked our 6th year of engagement and partnership with the OCP community through the OCP Global Summit, which took place on Oct. 17 – 19 in San Jose, Calif. Our journey started with the ORv2 12V power shelf, and we’re now transitioning towards the next-generation 48V ORv3 power shelf.