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A previous AE blog, Dynamic Reverse Pulsing – What About Duty Cycle?, discussed reactive sputter deposition of insulating thin films in large-area coaters, describing the benefits of using the Dynamic Reverse Pulse (DRP) power-delivery mode over the bipolar (BP) mode of dual magnetron sputtering. In DRP mode , dual targets are bipolar pulsed against an explicit anode and the duty cycle can be varied so that the polarity is positive on the target for a shorter time during pulsing. This allows clearing of charge build-up on the targets. In our studies, DRP mode showed increased deposition rate and reduced substrate temperature when compared to similar depositions with the BP mode.

DENVER, Colo.--(BUSINESS WIRE)-- Advanced Energy Industries, Inc. (NASDAQ: AEIS), a global leader in highly engineered, precision power conversion, measurement, and control solutions, today announced that its board of directors has authorized a quarterly cash dividend of $0.10 per share, payable on December 1, 2023 to shareholders of record as of November 20, 2023. Future dividend ...

DENVER, Colo.--(BUSINESS WIRE)-- Advanced Energy Industries, Inc. (NASDAQ: AEIS), a global leader in highly engineered, precision power conversion, measurement, and control solutions, today announced that its board of directors has authorized a quarterly cash dividend of $0.10 per share, payable on December 1, 2023 to shareholders of record as of November 20, 2023. Future dividend ...