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New Ascent® AMS II DC Plasma Power Supplies
May 7, 2024
New materials and cathode designs increasingly challenge process stability and film repeatability. At the same time, larger deposition areas heighten power requirements and potential arc-related damage. Ascent® AMS II provides stable, repeatable power regardless of process setup or conditions. Its Arc Management System™ (AMS) technology and onboard, embedded IoT intelligence maximize productivity and throughput. This low-noise, water-cooled design with expanded operating range also increases reliability, process capability, and installation flexibility.
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