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Etch

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Reliable plasma power for clean definition and minimal substrate damage. Only AE’s time-synced approach gets optimal etch results.
  • Synchronized source and bias control
  • Multi-level pulsing

Comprehensive Portfolio of Solutions for Enhanced Process Control

AE's plasma power supplies are customized to suit the unique needs of each etching application. Our portfolio includes RF, DC, and pulsed-DC products, impedance matching networks, remote plasma sources, and a sophisticated data collection, visualization, and analysis platform. Built with cutting-edge technology, these solutions ensure exact, repeatable power delivery for superior process precision and yield.
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