Remote Plasma Sources


High-Quality, Chamber-Clean Remote Plasma Source with Unrivaled Performance

Built to outlast and outperform the competition, the Xstream remote plasma source (RPS) is ideal for chamber cleaning purposes. It features a patented ignition method and algorithm as well as a proprietary aluminum-alloy, hard-anodized chamber.

  • Proven Performance: Unmatched reliability with proven field performance
  • Unique Ignition Method: Reduce tool downtime with dependable plasma ignition
  • No Expensive Coatings Needed: Custom alloy and advanced anodization ensure longer chamber life 
  • Rapid Chamber Cleaning: High feed-gas dissociation rate for efficient operation
  • Overview
  • Technical Specs
  • Documents
  • Service & Support


The highly efficient Xstream® RPS dissociates large volumes of NF3 and quickly cleans chambers, improving your overall tool performance. Its plasma chamber showcases high-purity aluminum alloy and patented cooling capabilities. Built to last for years without repair or expensive chamber coatings, the Xstream RPS is the smart choice for dependability and efficient performance.


  • Eliminate expensive chamber coatings with custom aluminum alloy and Type III hard anodization 
  • Improve chamber performance and durability via a cooling system that minimizes thermal stress
  • Increase efficiency and improve power delivery to the plasma with an Active Match Network
  • Precisely control power and processes thanks to real-time plasma measurements
  • Achieve reliable and reproducible plasma ignition via a patented ignition system 


  • Highly reliable RPS maximizes tool uptime
  • Effective reactive species transportation to process chamber for improved performance
  • Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)
  • 225 kHz to 660 kHz operating frequency
  • 8 kW/10 kW power models
  • Size

    H x W x D: 26.7 cm  x 25.25 cm  x 47.8 cm 
    H x W x D: 10.5“ x 9.94“ x 18.82“

  • Weight

    28.7 kg (63.2 lbs.)

  • AC Line Frequency

    50 to 60 Hz nominal; 47 to 63 Hz range

  • AC Input Current

    • 31 Amps nominal/35 Amps maximum per phase for the 10 kW version
    • 28 Amps nominal/31 Amps maximum per phase for the 8 kW version
  • Power Accuracy

    +/- 5% or +/- 200 W whichever is greater
    (measured at equivalent plasma impedance of 1.2 ohms)

  • Electrical Efficiency

    > 80% at full-rated power and nominal line

  • Power Factor

    > 0.90

Global Support & Services

Maximize fab productivity and capital equipment ROI with world-class support through each product lifecycle stage — from startup to long-term operation. Our service offerings are based on more than three decades of precision power and applications expertise.

Learn More

Applications Support & Consulting

Accelerate tool installations and process development programs, or address specific applications concerns with Advanced Energy's dedicated applications consultants and engineering staff. Benefit from on-site reviews, analyses, and consultations.

Learn More


Decrease variability in maintenance costs and provide additional cost protection. Advanced Energy offers whole-box extended warranties.

Learn More

Product Support

U.S.: +1 800 446 9167
Asia: +86 29 8874 1895
China: 400 8899 130
EMEA: +44 800 032 1546
U.K.: 08000 321 546

Thin Film Support
Thermal Product Support
Other Technical Support

Compare Products


Xstream Remote Plasma Source

Xstream 8 kW

Xstream Remote Plasma Source

Xstream 10 kW


0.1 to 4.0 Torr, < 1 slm Ar

0.1 to 4.0 Torr, < 1 slm Ar


0.5 to 12.0 Torr, up to 6 slm NF3

0.5 to 15.0 Torr, up to 8 slm NF3


≥ 98%

≥ 98%


Proprietary Al alloy

Proprietary Al alloy




Contact Us

Thank You

You may now view any resource on the Advanced Energy site. Click the button below to view your requested resource.

Thank You

You may now view any resource on the Advanced Energy site. Click the button below to view your requested resource.