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Etch

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Reliable plasma power for clean definition and minimal substrate damage. Only AE’s time-synced approach gets optimal etch results.

Synchronized source and bias control
Multi-level pulsing

Comprehensive Portfolio of Solutions for Enhanced Process Control

AE's plasma power supplies are customized to suit the unique needs of each etching application. Our portfolio includes RF, DC, and pulsed-DC products, impedance matching networks, remote plasma sources, and a sophisticated data collection, visualization, and analysis platform. Built with cutting-edge technology, these solutions ensure exact, repeatable power delivery for superior process precision and yield.

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Featured Products

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eVoS ME Bias Solution

The eVoS® platform enables direct control of wafer-surface voltage and ion energy distribution, empowering process engineers to optimize bias performance for specific process results.

Datasheet

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eVerest® RF Generator

Angstrom Era Precision Power

Datasheet

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eVoS LE Bias Solution

Asymmetric Bias Waveform Generator for Direct Control of Substrate Voltage and Ion Energy

Datasheet

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MAXstream Remote Plasma Source

Reliable Performance for Chamber Clean Applications

Datasheet

eVoS ME Bias Solution Datasheet	Power Delivery Systems	The eVoS® platform enables direct control of wafer-surface voltage and ion energy distribution, empowering process engineers to optimize bias performance for specific process results.
eVerest® RF Generator Datasheet	RF Plasma Generators	Angstrom Era Precision Power
eVoS LE Bias Solution Datasheet	Power Delivery Systems	Asymmetric Bias Waveform Generator for Direct Control of Substrate Voltage and Ion Energy
MAXstream Remote Plasma Source Datasheet	Remote Plasma Sources	Reliable Performance for Chamber Clean Applications
Bipolar		Improve Throughput and Virtually Eliminate Sticky Wafer and Wafer Popping Issues

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Featured Resources

PowerInsight by Advanced Energy Brochure

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Three Key Cabling Decisions to Optimize RF System Performance

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Navigator II Digital Matching Networks Brochure

Navigator II matching network provides rapid, accurate, and reliable matching across a wide range of power requirements. Download Navigator II Brochure for details regarding product specifications, electrical specifications, mechanical specifications and more

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Electrostatic Semiconductor Wafer Clamping/Chucking System (ESC) Application Note

The electrostatic chuck (ESC) is used in a variety of semiconductor processes to hold the wafer during processing.

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Etch

Comprehensive Portfolio of Solutions for Enhanced Process Control