Plasma Power Generators

LFGS

Economical, Mid-Frequency Generator Tailored for Plasma Processing

  • Wide-output frequency range
  • Compact design
  • Flexible communication protocol
  • Overview
  • Technical Specs
  • Service & Support

Overview

The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available. 

Benefits

  • Support a wide variety of applications
  • Access the lowest reflected power commercially available
  • Easily install
  • Efficiently use valuable space

Features

  • Variable frequency
  • Air cooling
  • Enhanced operating menu  
  • Active front panel
  • Pulse mode (0 to 10 kHz) CEX operation mode 2 analog user ports
  • RS-232, Ethernet, and Profibus communication

Global Support & Services

Maximize fab productivity and capital equipment ROI with world-class support through each product lifecycle stage — from startup to long-term operation. Our service offerings are based on more than three decades of precision power and applications expertise.

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Applications Support & Consulting

Accelerate tool installations and process development programs, or address specific applications concerns with Advanced Energy's dedicated applications consultants and engineering staff. Benefit from on-site reviews, analyses, and consultations.

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Warranties

Decrease variability in maintenance costs and provide additional cost protection. Advanced Energy offers whole-box extended warranties.

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Product Support

Call
Within the U.S.:
800.446.9167 (option 2)
Outside the U.S.:
+1.970.221.0108 (option 2)

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Thank You

You may now view any resource on the Advanced Energy site. Click the button below to view your requested resource.