Xstream Remote Plasma Source
High-Quality, Chamber-Clean Remote Plasma Source with Unrivaled Performance
Features
- Highly reliable RPS maximizes tool uptime
- Effective reactive species transportation to process chamber for improved performance
- Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)
- 225 kHz to 660 kHz operating frequency
- 8 kW/10 kW power models
Benefits
- Eliminate expensive chamber coatings with custom aluminum alloy and Type III hard anodization
- Improve chamber performance and durability via a cooling system that minimizes thermal stress
- Increase efficiency and improve power delivery to the plasma with an Active Match Network
- Precisely control power and processes thanks to real-time plasma measurements
- Achieve reliable and reproducible plasma ignition via a patented ignition system
Specifications
Cooling: | Hybrid (air and water) |
---|---|
Output Frequency (MHz, kHz): | 400 kHz |
Input Voltage (V): | 208 VAC |
Power Level (kW): | 6 kW |
Rack Width: | N/A, chamber mounted |
Communications Interface: | RS-232, Analog, Ethernet, EtherCAT |
Process Applications: | Chamber Clean, Reactive Etch, Reactive Deposition |
Chemical Compatibility: | Ar, O2, H2, N2, F2, H2O, NF3, CxFy |
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Technical Documentation
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Repair
Our worldwide service centers provide fast cycle times, use only AE-qualified parts, and follow the original product's specifications and test procedures for the highest quality repair or calibration.
Premium Services
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Refurbishments
Choose refurbishment over repair to minimize down time, extend life, and reduce the total cost of ownership of your mature power products.
Calibration and Alignment
Advanced Energy has the tools and processes to ensure your equipment continues to meet its original specifications. Our products are calibrated at global AE service sites with proprietary technology designed to exceed industry standards.
