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Showing results for "MAXstream" View All
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Data Sheets

MAXstream 300 Data Sheet

The MAXstream 300 is a compact, reliable, and cost-effective remote plasma source (RPS) solution for low flow (2 to 3 SLPM) NF3 chamber clean applications.

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Videos

Chamber Cleaning with Advanced Energy Remote Plasma Sources

In this video, learn how Advanced Energy's MAXstream remote plasma source (RPS) is used in CVD chamber cleaning. Extending AE’s leadership in process power, MAXstream delivers reliable performance across a broad range of flow rates, increasing productivity in semiconductor process equipment.

Data Sheets

MAXStream 600, 800, 1000, and 1200 Data Sheet

The MAXstream 600, 800, 1000, and 1200 are reliable and cost-effective remote plasma source (RPS) solutions for mid-flow (6 to 12 SLPM) NF3 chamber clean applications.

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You may now view any resource on the Advanced Energy site. Click the button below to view your requested resource.