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MAXstream 300 Data Sheet
The MAXstream 300 is a compact, reliable, and cost-effective remote plasma source (RPS) solution for low flow (2 to 3 SLPM) NF3 chamber clean applications.View Resource
Chamber Cleaning with Advanced Energy Remote Plasma Sources
In this video, learn how Advanced Energy's MAXstream remote plasma source (RPS) is used in CVD chamber cleaning. Extending AE’s leadership in process power, MAXstream delivers reliable performance across a broad range of flow rates, increasing productivity in semiconductor process equipment.
MAXStream 600, 800, 1000, and 1200 Data Sheet
The MAXstream 600, 800, 1000, and 1200 are reliable and cost-effective remote plasma source (RPS) solutions for mid-flow (6 to 12 SLPM) NF3 chamber clean applications.View Resource