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Chamber Cleaning with Advanced Energy Remote Plasma Sources
In this video, learn how Advanced Energy's MAXstream remote plasma source (RPS) is used in CVD chamber cleaning. Extending AE’s leadership in process power, MAXstream delivers reliable performance across a broad range of flow rates, increasing productivity in semiconductor process equipment.
Improving Ionizer Balance Using External Feedback Sensors Application Note
To limit electrostatic charge accumulation on surfaces where the sensitive devices are processed, every effort is made to ground all surfaces where the ESD-sensitive devices are processed. Learn how an internal feedback system can help the best ionizers limit ion imbalance at the work surface.View Resource
Medical Lasers and Aesthetic Equipment Application Note
The main challenge within the medical and aesthetic laser industry is to source power supplies that are fanless, suitable for use in portable devices, and provide multiple output voltages while maintaining a high-power density.View Resource
MAXStream 600, 800, 1000, and 1200 Data Sheet
The MAXstream 600, 800, 1000, and 1200 are reliable and cost-effective remote plasma source (RPS) solutions for mid-flow (6 to 12 SLPM) NF3 chamber clean applications.View Resource
System Improvements and Discussion to Minimize Lightning Arcs or Crazing
This article presents a few simplified electrical models that show the causes of lightning arc events and presents effective system design recommendations.View Resource