Pinnacle III Plus+ Pulsed DC Power Supply
Process-Proven, Pulsed DC for Single-Magnetron Reactive Sputtering of Thin Dielectric Films
- Charge clearing during the reverse pulse prevents arcs from developing
- Adjustable process through frequency and duty cycle control
- Compact air-cooled design expandable in main/satellite configurations
Features
- Adjustable frequency range of 5 to 350 kHz
- Variable duty cycle up to 45%
- Wide voltage range — single-tap wide impedance range
- Superior arc management
- Dual output available for multi-chamber production
Benefits
- Higher deposition and yield rates
- Superior film uniformity and quality
- Reduced substrate damage caused by arcing
- Excellent process flexibility and latitude
- Repeatable performance
Specifications
Cooling: | Air |
---|---|
Output Frequency (MHz, kHz): | 5 to 350 kHz |
Input Voltage (V): | 208, 400, 440, 480 VAC |
Power Level (kW): | 1.5 to 10 kW |
Rack Width: | Full rack |
Height (Inches): | 3U |
Output Voltage Range (V): | 325-800 V |
Communications Interface: | Ethernet, EtherCAT, DeviceNet, ProfiNet, Profibus, RS-232/485, EtherNet/IP, and analog communications |
Featured Resources

Pinnacle Plus Data Sheet
Download Pinnacle Plus+ Series Brochure for details regarding product specifications, electrical specifications, mechanical specifications and ordering information. Discover how Pinnacle Plus+'s superior efficiency, and high power factor meet your needs.

Pinnacle Plus+ Halo Pulsed-DC Power Supplies Datasheet

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