Ascent DMS Pulsed and DC Power System
Advanced Dual-Magnetron Sputtering Accessories
Features
- Modular and scalable (40, 60, and 120 kW models configurable up to 180 kW)
 - Selectable frequency (500 Hz to 50 kHz)
 - Adjustable duty cycle — independent power ratio regulation for each magnetron
 - Advanced process management through a tiered approach to arc mitigation
 - CEX (phase synchronization)
 
Benefits
- Increased film value: Repeatable, customizable deposited films
 - Lower cost of ownership and increased productivity
 - Higher power levels with improved stability and reduced arc damage
 - Easy scalability, integration, and support
 - Modular design allows you to pay for only what you need while enabling future capability expansion
 
Specifications
| Cooling: | Hybrid (air and water) | 
|---|---|
| Output Frequency (MHz, kHz): | 0.5 to 50 kHz | 
| Input Voltage (V): | 100 to 240 VAC | 
| Power Level (kW): | 40 to 120 kW | 
| Rack Width: | Full rack | 
| Height (Inches): | 6U, 10U | 
| Output Voltage Range (V): | 400-1000 V | 
| Communications Interface: | Ethernet, EtherCAT, DeviceNet, Profibus, RS-232/485, EtherNet/IP, and analog communications | 
Featured Resources
                    Ascent® DMS Brochure
The Ascent® DMS series offers unprecedented power delivery ease and control for dual-magnetron sputtering, enabling precise tuning of film characteristics.
                    Optimizing Static Deposition Processes White Paper
                    Optimizing Glass Process Stability, Throughput with the PowerInsight by Advanced Energy™ IoT Solution
Technical Documentation
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