How We Power the Process
As the DC and RF process power leader for over 30 years, Advanced Energy is relied on to make chips in every fab worldwide. Our recently expanded semiconductor portfolio offers new power products for electrostatic chucks (ESC), inspection, ion implant as well as etch and deposition. We now provide even more reliable and innovative solutions to meet your power and measurement needs.
Explore how we power the process.
i Chamber Clean Reliable and predictable plasma chamber clean with long chamber lifetime
i Plasma, Sputtering, & Ion Implant Density High capability power delivery and control for plasma density, sputtering ion energy, and ion implant energy.
& Ion Implant
& Ion Implant
i Remote Plasma Source High reliability design, advanced ignition process, and specialized chamber materials for long particle-free life. Learn More
i RF Generator Leading RF plasma control for process precision and reliability. Benefit from fast, seamless process transitions and advanced pulsing. Learn More DC Power Supply Wide power delivery, precise control, pulsed DC and advanced arc management system enable complex sputtering processes. Learn More High Voltage Power Reliable supplies for precision electron and ion beam acceleration, scanning and control. Learn More
RF, DC or High
i Match Networks Fast, accurate, and reliable RF matching. Tune-while-pulsing and advanced integrated RF metrology allows for tightest control. Learn More
i Wafer Control Electrostatic chuck wafer sensing, chucking, and temperature measurement and control for repeatable chamber-to-chamber matching with lowest latencyWafer Controli Optical Temperature Sensor Accurate and repeatable non-contact temperature measurement. Real-time measurement in-situ probes optimize process control. Learn MoreOptical Temperature
Sensori ESC Controller Enabling OEM modular system design with dual complementary floating outputs. Custom solutions for interlocks, HV relay for wafer discharge and reversible voltage for chuck/un-chuck leading to high efficiency and small size allowing on chamber mounting. Learn MoreESC Controlleri ESC Sensor Unique high integrity Clamp/De-Clamp sensing includes electrostatic chuck status and monitoring with capacitance and leakage current diagnostics. Learn MoreESC Sensor
i Dry Abatement Process tool-level plasma destruction and abatement of process exhaust gassesDry AbatementProcess Chamberi Plasma Abatement All-in-one dry abatement system with plasma chamber, power, and match network in a single compact chassis. Learn MorePlasma Abatement
i Physical Plasma Control Configurable power delivery, including multiple RF frequencies, to precisely control physical ion bombardment to optimize etch rates and sidewall contoursPhysical
Plasma Controli Support Power Compact, flexible power solutions for subsystems and support functionsSupport Poweri Match Networks Fast, accurate and reliable RF matching. Tune-while-pulsing and advanced integrated RF metrology allows for tightest control. Learn MoreMatch Networksi RF Generator Leading RF plasma control for process precision and reliability. Benefit from fast, seamless process transitions and advanced pulsing. Learn MoreRF Generatori Heater Power Controller Precise and reliable power control for electrostatic chucks helping to increase product quality, throughput, and yield. Learn MoreHeater Power
Controlleri Low Voltage Power Broad range of AC/DC platforms with single/multiple output solutions from 1 to 400 V and up to 3 kW, delivering highest reliability and power density and unique levels of flexibility including digital control. Learn MoreLow Voltage Power