How We Power the Process
As the DC and RF process power leader for over 30 years, Advanced Energy is relied on to make chips in every fab worldwide. Our recently expanded semiconductor portfolio offers new power products for electrostatic chucks (ESC), inspection, ion implant as well as etch and deposition. We now provide even more reliable and innovative solutions to meet your power and measurement needs.
Explore how we power the process.
& Ion Implant
i Wafer Control Electrostatic chuck wafer sensing, chucking, and temperature measurement and control for repeatable chamber-to-chamber matching with lowest latencyWafer ControlOptical Temperature
i Physical Plasma Control Configurable power delivery, including multiple RF frequencies, to precisely control physical ion bombardment to optimize etch rates and sidewall contoursPhysical
Plasma Controli Support Power Compact, flexible power solutions for subsystems and support functionsSupport PowerMatch NetworksRF GeneratorHeater Power