Ascent AP Pulsed and DC Power System
Unprecedented Power Control for Single- and Dual-Magnetron Sputtering
Features
- Process customization with extensive power delivery parameters
- Advanced process management through a tiered approach to arc mitigation
- Compact, single-unit solution (up to 30 kW)
- Set Point Compensation™ technology for stable throughput
- Wide operational range to enable a variety of process materials
- Compatible with PowerInsight by Advanced Energy™
Benefits
- Precise sputtering of dielectric and conductive films
- Expanded process control, flexibility, and innovation
- High film quality and throughput
- Repeatable, customizable films
- Higher power levels with reduced arc damage
- Easy integration and control
Specifications
Cooling: | Hybrid (air and water) |
---|---|
Output Frequency (MHz, kHz): | 5 to 150 kHz |
Input Voltage (V): | 400, 440, 440-480 VAC |
Power Level (kW): | 10 to 30 kW |
Rack Width: | Full rack |
Height (Inches): | 4U, 6U |
Output Voltage Range (V): | 400-1000V |
Communications Interface: | Ethernet, EtherCAT, ProfiNet, Profibus, RS-232/485, EtherNet/IP, and analog communications |
Featured Resources

Ascent AP Data Sheet

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