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Advanced Energy’s field-proven, Precision PowerTM solutions offer extreme control, peerless arc handling, and cutting-edge match technology. Unlock new fabrication processes with our plasma power generators’ precise performance and comprehensive controls and capabilities.
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Technical Videos
Advanced Energy’s eVoS™: A Paradigm Shift in Semiconductor Bias Technology
Feb 6, 2024
Learn more about AE's eVoS(TM) Assymetric Bias Waveform Generator: By maximizing the ability to tailor ion energy, eVoS enables precise command of #semiconductor etch and deposition geometries at very small dimensions. Direct control of wafer-surface voltage and ion energy distribution (IED) empowers process engineers to optimize bias performance for specific process results, ensuring sensitive feature formation. In addition, fast digital metrology and novel control algorithms enable the production of narrower IEDs compared to alternative technologies. These capabilities change what’s possible in plasma processing.
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