Rapid Ox Remote Plasma Source
Ideal Remote Plasma Source for Oxygen-Based Processes
Eigenschaften
- Quartz liner makes it ideal for photoresist ashing or carbon chamber clean processes
- Variable frequency matching provides a range of plasma impedance operation, controlled by varying gas chemistry, pressure, and power set point
- Improved thermal management helps ensure long chamber lifetime
- Rapid OX quickly ignites and reaches steady-state operation due to low dynamic pressure overshoot
Vorteile
- Significantly reduce downtime and cost of ownership via a removable and replaceable quartz chamber
- Improve process performance thanks to a high dissociation rate and high-density radical generation
- Ensure repeatable, controllable processes with variable frequency tuning and precise power control
- Increase the chamber lifetime and reduce service costs thanks to the reliable design and cooling system
- Improve tool utilization, reduce preventive maintenance, and lower CoO
Spezifikationen
Kühlung: | Hybrid (air and water) |
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Ausgangsfrequenz (MHz, kHz): | 400 kHz |
Eingangsspannung (V): | 208 VAC |
Leistungsstufe (kW): | 6 kW |
Rack Breite: | N/A, chamber mounted |
Kommunikationsschnittstelle: | RS-232, Analog, Ethernet |
Anwendungen verarbeiten: | Chamber Clean |
Chemische Verträglichkeit: | O2, N2 |
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