홈 Products Plasma Power Products Pulsed and DC Power Systems PEII Low Frequency Power Supply

PEII Low Frequency Power Supply

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영업팀에 문의

The PEII power supply provides 40 kHz pulse width modulation (PWM). It features advanced arc control and internal load matching with outputs of up to 60 kW when units are combined—requiring no external hardware such as transformers or tuners. The power supply also offers two distinct arc-handling circuits, and the floating output can be grounded on either side.

특징

•   High power density
•   Wide tap range
•   Regulation on power, voltage, or current
•   Enhanced arc control
•   Automatic process safeguard
•   Flexible modularity
•   Efficient, compact design

혜택

•   Dual-cathode and other reactive sputtering applications used to create energy-efficient optical and glass coatings
•   Dual-cathode PECVD that produce film and plastic coatings for decorative films, food packaging, capacitor films, and other films
•   PECVD, DLC, metal oxides, and carbon coatings that provide tool and tribological coatings

사양

냉각:	Water
출력 주파수(MHz, kHz):	40 kHz
입력 전압(V):	208, 400 VAC
전력 수준(kW):	5, 10 kW
랙 너비:	Full Rack
높이(인치):	4U
통신 인터페이스:	Analog
애플리케이션 처리:	Reactive sputtering

기술 문서

제목	유형
Glass Production Solutions Brochure (12 MB)	브로셔
Glass Production Solutions Brochure (12 MB)	브로셔
Optimizing Glass Process Stability, Throughput with the PowerInsight by Advanced Energy™ IoT Solution (404 KB)	사례 연구
Optimizing Glass Process Stability, Throughput with the PowerInsight by Advanced Energy™ IoT Solution (404 KB)	사례 연구
PEII Series Data Sheet (1 MB)	데이터 시트