ホーム Products Plasma Power Products Pulsed and DC Power Systems PEII Low Frequency Power Supply

PEII Low Frequency Power Supply

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営業担当

The PEII power supply provides 40 kHz pulse width modulation (PWM). It features advanced arc control and internal load matching with outputs of up to 60 kW when units are combined—requiring no external hardware such as transformers or tuners. The power supply also offers two distinct arc-handling circuits, and the floating output can be grounded on either side.

特徴

•   High power density
•   Wide tap range
•   Regulation on power, voltage, or current
•   Enhanced arc control
•   Automatic process safeguard
•   Flexible modularity
•   Efficient, compact design

メリット

•   Dual-cathode and other reactive sputtering applications used to create energy-efficient optical and glass coatings
•   Dual-cathode PECVD that produce film and plastic coatings for decorative films, food packaging, capacitor films, and other films
•   PECVD, DLC, metal oxides, and carbon coatings that provide tool and tribological coatings

仕様

冷却:	Water
出力周波数（MHz、kHz）:	40 kHz
入力電圧 (V):	208, 400 VAC
出力レベル（kW）:	5, 10 kW
ラック幅:	Full Rack
高さ（インチ）:	4U
通信インターフェース:	Analog
プロセスアプリケーション:	Reactive sputtering

技術文書

タイトル	タイプ
Glass Production Solutions Brochure (12 MB)	パンフレット
Glass Production Solutions Brochure (12 MB)	パンフレット
Optimizing Glass Process Stability, Throughput with the PowerInsight by Advanced Energy™ IoT Solution (404 KB)	ケーススタディ
Optimizing Glass Process Stability, Throughput with the PowerInsight by Advanced Energy™ IoT Solution (404 KB)	ケーススタディ
PEII Series Data Sheet (1 MB)	データシート