通过精确控制功率实现完美晶圆剥离
去除残留的光刻胶,对于确保高质量产品至关重要。Advanced Energy 的等离子电源输送系统、交流/直流和直流/直流前端电源以及机架系统产品组合能够以可控、高效的方式提供去除光刻胶所需的精确功率。我们的产品设计始终致力于优化效率和功率密度,在降低总拥有成本的同时确保可靠性和长时间正常运行。AE 的各种行业标准板载电源模块得到原始设备制造商和系统集成商的广泛应用,可提供半导体制造商所需的灵活性和可扩展性,满足剥离工艺的要求。

特色产品
RF Plasma Generators | High-Power Density for Compact Installation | |
RF Plasma Generators | Unparalleled Breadth of RF-Application Delivery without Custom Lead Times | |
RF Plasma Generators | Industry-Leading, Repeatable Power Delivery for Core Plasma Applications | |
RF Match Networks | Economical, Digital, Configurable Matching Network Solution | |
RF Match Networks | Rapid, Accurate, and Reliable Digitally-Tuned Matching |
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Blog
SEMICON West 2022: SEMI Goes Big; Chips Get Small
八月 04, 2022
What was new this year at SEMICON® West? This July, semiconductor professionals gathered virtually and in person at the Moscone Convention Center to make connections, exchange ideas, and discover what’s on the horizon for the industry.

Blog
The High-Voltage Innovations Behind Moore’s Law
七月 06, 2022
By Ray Morgan
Anyone associated with the semiconductor industry – and many people who aren’t – will be familiar with Moore’s Law, the concept that the number of transistors (and, thus, the processing power) per unit of integrated circuit (IC) area doubles every two years.