沉积

AE 等离子功率传输、温度测量、温度控制和晶圆控制解决方案的精确性能和精密控制有助于提高可重复性和产量。我们提供各种射频、直流和脉冲直流电源输送系统以及各种匹配网络，以满足特定的工艺要求。

通过全面的解决方案组合加强工艺控制

Advanced Energy 的射频等离子体功率传输和高速匹配技术可为要求苛刻的 PECVD 和 PEALD 沉积工艺提供性能定制和优化。我们的直流技术可为 PVD (溅射) 和 ECD 沉积工艺提供可配置电弧响应、功率精度和工艺可重复性。我们还提供温度监控、温度控制和晶圆控制技术，可在制造工艺的多个环节实现精确控制。

另请参见：

特色产品

特色

eVerest

Angstrom Era Precision Power

数据表

特色

Ascent DMS

Advanced Dual-Magnetron Sputtering Accessories

特色

MAXstream

Reliable, High-Performance Remote Plasma Source for Chamber Clean Applications

数据表

特色

Ascent AMS

Stable Power Delivery for Extreme Arc Conditions and Highly Repeatable Films

数据表

eVerest 数据表	RF Plasma Generators	Angstrom Era Precision Power
Ascent DMS	Pulsed and DC Power Systems	Advanced Dual-Magnetron Sputtering Accessories
MAXstream 数据表	Remote Plasma Sources	Reliable, High-Performance Remote Plasma Source for Chamber Clean Applications
Ascent AMS 数据表	Pulsed and DC Power Systems	Stable Power Delivery for Extreme Arc Conditions and Highly Repeatable Films
Navigator II 数据表	RF Match Networks	Rapid, Accurate, and Reliable Digitally-Tuned Matching
Paramount 数据表	RF Plasma Generators	Industry-Leading, Repeatable Power Delivery for Core Plasma Applications
Apex 数据表	RF Plasma Generators	High-Power Density for Compact Installation
Cesar 数据表	RF Plasma Generators	Unparalleled Breadth of RF-Application Delivery without Custom Lead Times
Xstream 数据表	Remote Plasma Sources	High-Quality, Chamber-Clean Remote Plasma Source with Unrivaled Performance
Navio 数据表	RF Match Networks	Economical, Digital, Configurable Matching Network Solution
Pinnacle III 数据表	Pulsed and DC Power Systems	The Most Recognized DC Power Supply for <= 20 kW Processes
Pinnacle III+ 数据表	Pulsed and DC Power Systems	Process-Proven, Pulsed DC for Single-Magnetron Reactive Sputtering of Thin Dielectric Films
Bipolar		Improve Throughput and Virtually Eliminate Sticky Wafer and Wafer Popping Issues
Ascent AP 数据表	Pulsed and DC Power Systems	Unprecedented Power Control for Single- and Dual-Magnetron Sputtering