Rapid Ox Remote Plasma Source
Ideal Remote Plasma Source for Oxygen-Based Processes
특징
- Quartz liner makes it ideal for photoresist ashing or carbon chamber clean processes
- Variable frequency matching provides a range of plasma impedance operation, controlled by varying gas chemistry, pressure, and power set point
- Improved thermal management helps ensure long chamber lifetime
- Rapid OX quickly ignites and reaches steady-state operation due to low dynamic pressure overshoot
혜택
- Significantly reduce downtime and cost of ownership via a removable and replaceable quartz chamber
- Improve process performance thanks to a high dissociation rate and high-density radical generation
- Ensure repeatable, controllable processes with variable frequency tuning and precise power control
- Increase the chamber lifetime and reduce service costs thanks to the reliable design and cooling system
- Improve tool utilization, reduce preventive maintenance, and lower CoO
사양
냉각: | Hybrid (air and water) |
---|---|
출력 주파수(MHz, kHz): | 400 kHz |
입력 전압(V): | 208 VAC |
전력 수준(kW): | 6 kW |
랙 너비: | N/A, chamber mounted |
통신 인터페이스: | RS-232, Analog, Ethernet |
애플리케이션 처리: | Chamber Clean |
화학적 호환성: | O2, N2 |
Featured Resources
기술 문서
관련 애플리케이션
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