MAXstream Remote Plasma Source
Reliable, High-Performance Remote Plasma Source for Chamber Clean Applications
특징
- MAXstream 300 (≤ 3 L) for low flow applications and MAXstream 1200 (≤ 12 L) for higher flow applications
- Highly reliable RPS maximizes tool uptime
- Enhanced cooling of plasma source walls to reduce damage from thermal expansion and chemical erosion
- Active monitoring and control of plasma power for advanced power control
혜택
- Optimize cost via multiple flow options
- Save valuable tool space with a smaller footprint than Xstream RPS
- Extremely reliable ignition with unique AE dual ignition cores
- Increase chamber life with proprietary AE chamber design
- Reduce cleaning time with up to 12 SLPM flow capabilities
사양
냉각: | Water |
---|---|
출력 주파수(MHz, kHz): | 400 kHz |
입력 전압(V): | 208 VAC |
전력 수준(kW): | 6 to 12 kW |
랙 너비: | N/A, chamber mounted |
통신 인터페이스: | RS-232, Analog, Ethernet, EtherCAT |
애플리케이션 처리: | Chamber Clean, Reactive Etch, Reactive Deposition |
화학적 호환성: | Ar, O2, H2, N2, F2, H2O, NF3, CxFy |
Featured Resources
기술 문서
기술 동영상

Chamber Cleaning with Advanced Energy Remote Plasma Sources
관련 애플리케이션
모든 애플리케이션 살펴보기서비스
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