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Improving Thin Film Quality: Advanced Pyrometry Solutions for Precise Vacuum Chamber Temperature Monitoring
10月 27, 2025
By Tim Dubbs
Depositing materials in a vacuum environment reduces contamination and enables materials to travel unimpeded to the substrate. As such, this technique is an important industrial process for creating thin films and coatings across a diverse range of applications including semiconductor manufacturing, optics or glass and beyond.
Blog
Are You Ready for Level VII Efficiency?
9月 25, 2025
The U.S. Department of Energy’s (DOE) Level VII efficiency standards are currently in the final stages before publication and are anticipated to come into force in about two years. The rules will impact several applications, from medical and industrial technologies to IT equipment as well as home appliances, lighting, consumer products and HVAC systems.
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Studies of Dynamic Reverse Pulsing and Bipolar Reactive Sputtering of Silicon Oxide Films with No Detectable Inclusion of Anode Material
10月 13, 2020
In our recent blog post, we demonstrated how silicon dioxide thin films can be sputtered with a reliably high quality and rate in an inline coating machine at our Customer Solutions Lab in Karlstein, Germany. Comparisons were made for films sputtered at a high argon flow, and thus higher-pressure, during deposition and a low argon flow and thus a lower deposition pressure.
Blog
Q&A: How Advanced Energy’s Customer Solutions Lab is Innovating the Future of Thin Films
10月 08, 2020
By Uwe Krause
Advanced Energy’s Customer Solutions Lab opened in the fall of 2019, establishing a new resource for our customers to explore new thin-film innovations without disrupting production timelines while offering greater flexibility for R&D.