eVoS LE Bias Solution
- Ability to produce near mono-energetic ion energy distributions
- Pulse capability with necessary input and output signals for synchronization
- Integrated design and compact size eliminates need for matching network
eVoS ME Bias Solution
- Customized ion energy distribution maximizes concentration to process-optimal levels.
- Independently regulated voltage and current output enhances control of bias conditions.
- Proprietary control system enables direct manipulation of wafer bias characteristics.
- Fast, digitized metrology provides real-time output monitoring and control.