Xstream Remote Plasma Source
High-Quality, Chamber-Clean Remote Plasma Source with Unrivaled Performance
特徴
- Highly reliable RPS maximizes tool uptime
- Effective reactive species transportation to process chamber for improved performance
- Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)
- 225 kHz to 660 kHz operating frequency
- 8 kW/10 kW power models
メリット
- Eliminate expensive chamber coatings with custom aluminum alloy and Type III hard anodization
- Improve chamber performance and durability via a cooling system that minimizes thermal stress
- Increase efficiency and improve power delivery to the plasma with an Active Match Network
- Precisely control power and processes thanks to real-time plasma measurements
- Achieve reliable and reproducible plasma ignition via a patented ignition system
仕様
冷却: | Hybrid (air and water) |
---|---|
出力周波数(MHz、kHz): | 400 kHz |
入力電圧 (V): | 208 VAC |
出力レベル(kW): | 6 kW |
ラック幅: | N/A, chamber mounted |
通信インターフェース: | RS-232, Analog, Ethernet, EtherCAT |
プロセスアプリケーション: | Chamber Clean, Reactive Etch, Reactive Deposition |
化学的適合性: | Ar, O2, H2, N2, F2, H2O, NF3, CxFy |
Featured Resources
技術文書
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Repair
Our worldwide service centers provide fast cycle times, use only AE-qualified parts, and follow the original product's specifications and test procedures for the highest quality repair or calibration.
Premium Services
Combine services into a cost-effective plan including warranties, on-site visits, and more.
Refurbishments
Choose refurbishment over repair to minimize down time, extend life, and reduce the total cost of ownership of your mature power products.
Calibration and Alignment
Advanced Energy has the tools and processes to ensure your equipment continues to meet its original specifications. Our products are calibrated at global AE service sites with proprietary technology designed to exceed industry standards.
