MAXstream Remote Plasma Source
Reliable, High-Performance Remote Plasma Source for Chamber Clean Applications
特徴
- MAXstream 300 (≤ 3 L) for low flow applications and MAXstream 1200 (≤ 12 L) for higher flow applications
- Highly reliable RPS maximizes tool uptime
- Enhanced cooling of plasma source walls to reduce damage from thermal expansion and chemical erosion
- Active monitoring and control of plasma power for advanced power control
メリット
- Optimize cost via multiple flow options
- Save valuable tool space with a smaller footprint than Xstream RPS
- Extremely reliable ignition with unique AE dual ignition cores
- Increase chamber life with proprietary AE chamber design
- Reduce cleaning time with up to 12 SLPM flow capabilities
仕様
冷却: | Water |
---|---|
出力周波数(MHz、kHz): | 400 kHz |
入力電圧 (V): | 208 VAC |
出力レベル(kW): | 6 to 12 kW |
ラック幅: | N/A, chamber mounted |
通信インターフェース: | RS-232, Analog, Ethernet, EtherCAT |
プロセスアプリケーション: | Chamber Clean, Reactive Etch, Reactive Deposition |
化学的適合性: | Ar, O2, H2, N2, F2, H2O, NF3, CxFy |
Featured Resources
技術文書
テクニカル・ビデオ

Chamber Cleaning with Advanced Energy Remote Plasma Sources
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Repair
Our worldwide service centers provide fast cycle times, use only AE-qualified parts, and follow the original product's specifications and test procedures for the highest quality repair or calibration.
Calibration and Alignment
Advanced Energy has the tools and processes to ensure your equipment continues to meet its original specifications. Our products are calibrated at global AE service sites with proprietary technology designed to exceed industry standards.
Refurbishments
Choose refurbishment over repair to minimize down time, extend life, and reduce the total cost of ownership of your mature power products.
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Power your process with data using PowerInsight by Advanced Energy™, transforming data into actionable intelligence with advanced analytics and machine learning, enabling you to improve yield and reduce unplanned downtime.
