Ascent DMS Pulsed and DC Power System
Advanced Dual-Magnetron Sputtering Accessories
特徴
- Modular and scalable (40, 60, and 120 kW models configurable up to 180 kW)
- Selectable frequency (500 Hz to 50 kHz)
- Adjustable duty cycle — independent power ratio regulation for each magnetron
- Advanced process management through a tiered approach to arc mitigation
- CEX (phase synchronization)
メリット
- Increased film value: Repeatable, customizable deposited films
- Lower cost of ownership and increased productivity
- Higher power levels with improved stability and reduced arc damage
- Easy scalability, integration, and support
- Modular design allows you to pay for only what you need while enabling future capability expansion
仕様
冷却: | Hybrid (air and water) |
---|---|
出力周波数(MHz、kHz): | 0.5 to 50 kHz |
入力電圧 (V): | 100 to 240 VAC |
出力レベル(kW): | 40 to 120 kW |
ラック幅: | Full rack |
高さ(インチ): | 6U, 10U |
出力電圧範囲 (V): | 400-1000 V |
通信インターフェース: | Ethernet, EtherCAT, DeviceNet, Profibus, RS-232/485, EtherNet/IP, and analog communications |
Featured Resources

Ascent® DMS Brochure
The Ascent® DMS series offers unprecedented power delivery ease and control for dual-magnetron sputtering, enabling precise tuning of film characteristics.

Optimizing Static Deposition Processes White Paper

Optimizing Glass Process Stability, Throughput with the PowerInsight by Advanced Energy™ IoT Solution
技術文書
テクニカル・ビデオ

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