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Ascent AP Pulsed and DC Power System

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Unprecedented Power Control for Single- and Dual-Magnetron Sputtering

Building on AE®’s premier bipolar pulsed-DC technology, Ascent® AP power supplies extend your ability to optimize output with advanced pulse shaping, as well as four-block progressive arc management that includes full voltage reversal and self-adjusting arc parameters. This compact solution’s patented pulsing technology proactively inhibits arcs, while its wide operational range unlocks material options to extend single- and dual-magnetron process flexibility and material innovation.

特徴

  • Process customization with extensive power delivery parameters
  • Advanced process management through a tiered approach to arc mitigation
  • Compact, single-unit solution (up to 30 kW)
  • Set Point Compensation™ technology for stable throughput
  • Wide operational range to enable a variety of process materials
  • Compatible with PowerInsight by Advanced Energy™

メリット

  • Precise sputtering of dielectric and conductive films
  • Expanded process control, flexibility, and innovation
  • High film quality and throughput
  • Repeatable, customizable films
  • Higher power levels with reduced arc damage
  • Easy integration and control

仕様

冷却: Hybrid (air and water)
出力周波数(MHz、kHz): 5 to 150 kHz
入力電圧 (V): 400, 440, 440-480 VAC
出力レベル(kW): 10 to 30 kW
ラック幅: Full rack
高さ(インチ): 4U, 6U
出力電圧範囲 (V): 400-1000V
通信インターフェース: Ethernet, EtherCAT, ProfiNet, Profibus, RS-232/485, EtherNet/IP, and analog communications
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