Xstream Remote Plasma Source
High-Quality, Chamber-Clean Remote Plasma Source with Unrivaled Performance
特点
- Highly reliable RPS maximizes tool uptime
- Effective reactive species transportation to process chamber for improved performance
- Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)
- 225 kHz to 660 kHz operating frequency
- 8 kW/10 kW power models
益处
- Eliminate expensive chamber coatings with custom aluminum alloy and Type III hard anodization
- Improve chamber performance and durability via a cooling system that minimizes thermal stress
- Increase efficiency and improve power delivery to the plasma with an Active Match Network
- Precisely control power and processes thanks to real-time plasma measurements
- Achieve reliable and reproducible plasma ignition via a patented ignition system
规格
冷却: | Hybrid (air and water) |
---|---|
输出频率(兆赫、千赫): | 400 kHz |
输入电压 (V): | 208 VAC |
功率等级(千瓦): | 6 kW |
机架宽度: | N/A, chamber mounted |
通信接口: | RS-232, Analog, Ethernet, EtherCAT |
流程应用: | Chamber Clean, Reactive Etch, Reactive Deposition |
化学兼容性: | Ar, O2, H2, N2, F2, H2O, NF3, CxFy |
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Advanced Energy has the tools and processes to ensure your equipment continues to meet its original specifications. Our products are calibrated at global AE service sites with proprietary technology designed to exceed industry standards.