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eVerest RF Generator
Angstrom-Era Precision Power
特点
- Full RF delivery system, multiple options for matching solutions, and intelligent synchronization
- Speed and control within programmable multi-level pulse profiles
- High-speed RF output response and pulse-state rise/fall times
- Up to ±10% frequency tuning range
- Designed-in dP/dZ stability
- PowerInsight by Advanced Energy™ IoT ecosystem
益处
- Enables novel process development for < 2 nm deposition and etch profiles
- Provides reliable ignition with RF stability independent of cable length
- Integrates seamlessly into any plasma system
- Increases process space and widens stability window
- Backed by worldwide product and application support from local service centers
规格
| 冷却: | Water |
|---|---|
| 输出频率（兆赫、千赫）: | 1 to 65 MHz |
| 输入电压 (V): | 200/240 VAC, 400-480 VAC |
| 功率等级（千瓦）: | 3 to 10 kW |
| 机架宽度: | Half and Full rack |
| 高度（英寸）: | 3U |
| 通信接口: | EtherCAT, Ethernet, RS-232, DeviceNet |
| 高级功能: | Multi-level Pulsing, arc management, CEX, MBFT |
Featured Resources
eVerest and NavX RF Delivery System
Forming a complete RF delivery system, the eVerest™ RF generator and NavX™ matching network propel process innovation as chips approach Angstrom scale geometries
eVerest Brochure
eVerest’s configurable multi-level pulsing enables instantaneous or user-defined transition timing. Download eVerest brochure for details on benefits, features, specifications and more.
Navigator II Digital Matching Networks Brochure
Navigator II matching network provides rapid, accurate, and reliable matching across a wide range of power requirements. Download Navigator II Brochure for details regarding product specifications, electrical specifications, mechanical specifications and more
Substrate Biasing for Sputter Deposition Processes
Explore the principles and practices of substrate biasing, examining its impact on thin-film characteristics and the various methods used to achieve optimal results.
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