Rapid Ox Remote Plasma Source
Ideal Remote Plasma Source for Oxygen-Based Processes
特点
- Quartz liner makes it ideal for photoresist ashing or carbon chamber clean processes
- Variable frequency matching provides a range of plasma impedance operation, controlled by varying gas chemistry, pressure, and power set point
- Improved thermal management helps ensure long chamber lifetime
- Rapid OX quickly ignites and reaches steady-state operation due to low dynamic pressure overshoot
益处
- Significantly reduce downtime and cost of ownership via a removable and replaceable quartz chamber
- Improve process performance thanks to a high dissociation rate and high-density radical generation
- Ensure repeatable, controllable processes with variable frequency tuning and precise power control
- Increase the chamber lifetime and reduce service costs thanks to the reliable design and cooling system
- Improve tool utilization, reduce preventive maintenance, and lower CoO
规格
冷却: | Hybrid (air and water) |
---|---|
输出频率(兆赫、千赫): | 400 kHz |
输入电压 (V): | 208 VAC |
功率等级(千瓦): | 6 kW |
机架宽度: | N/A, chamber mounted |
通信接口: | RS-232, Analog, Ethernet |
流程应用: | Chamber Clean |
化学兼容性: | O2, N2 |
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