MAXstream Remote Plasma Source
Reliable, High-Performance Remote Plasma Source for Chamber Clean Applications
特点
- MAXstream 300 (≤ 3 L) for low flow applications and MAXstream 1200 (≤ 12 L) for higher flow applications
- Highly reliable RPS maximizes tool uptime
- Enhanced cooling of plasma source walls to reduce damage from thermal expansion and chemical erosion
- Active monitoring and control of plasma power for advanced power control
益处
- Optimize cost via multiple flow options
- Save valuable tool space with a smaller footprint than Xstream RPS
- Extremely reliable ignition with unique AE dual ignition cores
- Increase chamber life with proprietary AE chamber design
- Reduce cleaning time with up to 12 SLPM flow capabilities
规格
冷却: | Water |
---|---|
输出频率(兆赫、千赫): | 400 kHz |
输入电压 (V): | 208 VAC |
功率等级(千瓦): | 6 to 12 kW |
机架宽度: | N/A, chamber mounted |
通信接口: | RS-232, Analog, Ethernet, EtherCAT |
流程应用: | Chamber Clean, Reactive Etch, Reactive Deposition |
化学兼容性: | Ar, O2, H2, N2, F2, H2O, NF3, CxFy |
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Chamber Cleaning with Advanced Energy Remote Plasma Sources
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